SECONDARY ION EMISSION FROM SILICON AND SILICON-OXIDE

被引：83

作者：

MAUL, J ^{[1
]}

WITTMAACK, K ^{[1
]}

机构：

[1] GESELL STRAHLEN & UMWELT FORSCH MBH,PHYS TECH ABT,D-8042 NEUHERBERG,FED REP GER

来源：

SURFACE SCIENCE | 1975年 / 47卷 / 01期

关键词：

D O I：

10.1016/0039-6028(75)90300-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：358 / 369

页数：12

共 26 条

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