X-RAY-SCATTERING STUDIES OF THE SI-SIO2 INTERFACE

被引：91

作者：

FUOSS, PH

NORTON, LJ

BRENNAN, S

FISCHERCOLBRIE, A

机构：

[1] STANFORD UNIV,SYNCHROTRON RADIAT LAB,STANFORD,CA 94305

[2] HEWLETT PACKARD LABS,PALO ALTO,CA 94303

来源：

关键词：

D O I：

10.1103/PhysRevLett.60.600

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：600 / 603

页数：4

共 11 条

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