THERMOMIGRATION PROCESSING OF ISOLATION GRIDS IN POWER STRUCTURES

被引：20
作者：
ANTHONY, TR
BOAH, JK
CHANG, MF
CLINE, HE
机构：
[1] GE,SCHENECTADY,NY 12301
[2] UNIV SCI & TECHNOL,DEPT MIN & MINERAL ENGN,KUMASI,GHANA
来源：
IEEE TRANSACTIONS ON ELECTRON DEVICES | 1976年 / 23卷 / 08期
关键词：
D O I：
10.1109/T-ED.1976.18492
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：818 / 823
页数：6
相关论文
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