INFRARED OPTICAL-PROPERTIES OF ELECTRON-BEAM EVAPORATED SILICON OXYNITRIDE FILMS

被引：37
作者：
ERIKSSON, TS
GRANQVIST, CG
机构：
来源：
APPLIED OPTICS | 1983年 / 22卷 / 20期
关键词：
D O I：
10.1364/AO.22.003204
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：3204 / 3206
页数：3
相关论文
共 26 条
[1]  
Born M., 1975, PRINCIPLES OPTICS, VFifth
[2]   PROPERTIES OF SIXOYNZ FILMS ON SI [J].
BROWN, DM ;
GRAY, PV ;
HEUMANN, FK ;
PHILIPP, HR ;
TAFT, EA .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) :311-&
[3]   FILMS OF SILICON NITRIDE-SILICON DIOXIDE MIXTURES [J].
CHU, TL ;
SZEDON, JR ;
LEE, CH .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1968, 115 (03) :318-&
[4]   STRUCTURE OF SILICON-NITRIDE FILMS .3. OXIDATION OF SILICON NITRIDE DEFECTS [J].
EDELMAN, FL .
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1979, 51 (02) :375-381
[5]   INFRARED OPTICAL-PROPERTIES OF EVAPORATED ALUMINA FILMS [J].
ERIKSSON, TS ;
HJORTSBERG, A ;
NIKLASSON, GA ;
GRANQVIST, CG .
APPLIED OPTICS, 1981, 20 (15) :2742-2746
[6]   RADIATIVE COOLING COMPUTED FOR MODEL ATMOSPHERES [J].
ERIKSSON, TS ;
GRANQVIST, CG .
APPLIED OPTICS, 1982, 21 (23) :4381-4388
[7]  
ERIKSSON TS, 1982, 7TH P INT C VAC MET, P696
[8]   REACTIVELY SPUTTERED SILICON OXYNITRIDE AS A DIELECTRIC MATERIAL FOR METAL-INSULATOR-METAL CAPACITORS [J].
FRANK, RI ;
MOBERG, WL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (04) :524-&
[9]   RADIATIVE COOLING TO LOW-TEMPERATURES WITH SELECTIVELY IR-EMITTING SURFACES [J].
GRANQVIST, CG ;
HJORTSBERG, A ;
ERIKSSON, TS .
THIN SOLID FILMS, 1982, 90 (02) :187-190
[10]   RADIATIVE COOLING TO LOW-TEMPERATURES - GENERAL-CONSIDERATIONS AND APPLICATION TO SELECTIVELY EMITTING SIO FILMS [J].
GRANQVIST, CG ;
HJORTSBERG, A .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (06) :4205-4220
123