POLYCRYSTALLINE SILICON FILMS ON ALUMINUM SHEETS FOR SOLAR CELL APPLICATION

被引：37

作者：

FANG, PH

EPHRATH, L

NOWAK, WB

机构：

[1] BOSTON COLL,DEPT PHYS,CHESTNUT HILL,MA 02167

[2] NORTHEASTERN UNIV,DEPT MECH ENGN,BOSTON,MA 02115

来源：

关键词：

D O I：

10.1063/1.1655320

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：583 / 584

页数：2

共 7 条

[1]

FANG PH, 1974, NSFGI37975 REP

[2]

FANG PH, 1970, P GROUND APPLICATION

[3]

HANSEN M, 1958, CONSTITUTION BINARY, P132

[4]

ILES P, PRIVATE COMMUNICATIO

[5] EPITAXIAL GROWTH OF SILICON AND GERMANIUM (2) [J].

LI, CH .

PHYSICA STATUS SOLIDI, 1966, 15 (02) :419-+

[6] CRYSTALLIZATION OF GE AND SI IN METAL-FILMS .1. [J].

OTTAVIAN.G ;

SIGURD, D ;

MARRELLO, V ;

MAYER, JW ;

MCCALDIN, JO .

[7]

OTTAVIANI G, 1974, J APPL PHYS, V45, P1740