INTERACTION OF METAL LAYERS WITH POLYCRYSTALLINE SI

被引：42

作者：

NAKAMURA, K

OLOWOLAFE, JO

LAU, SS

NICOLET, MA

MAYER, JW

SHIMA, R

机构：

[1] CALTECH,PASADENA,CA 91125

[2] JET PROP LAB,PASADENA,CA 91103

来源：

JOURNAL OF APPLIED PHYSICS | 1976年 / 47卷 / 04期

关键词：

D O I：

10.1063/1.322826

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1278 / 1283

页数：6

共 11 条

[1]

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[7] DIFFUSIVITY AND SOLUBILITY OF SI IN AL METALLIZATION OF INTEGRATED CIRCUITS [J].

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[9]

NAKAMURA K, TO BE PUBLISHED

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