GENERAL RELATIONSHIP FOR THERMAL OXIDATION OF SILICON

被引：3013

作者：

DEAL, BE

GROVE, AS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1965年 / 36卷 / 12期

关键词：

D O I：

10.1063/1.1713945

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3770 / &

共 28 条

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