ELECTRON-BEAM EXPOSURE OF OPTICAL GRATINGS

被引：6

作者：

YANG, L ^{[1
]}

TURNER, JJ ^{[1
]}

RHODES, LB ^{[1
]}

TANG, CL ^{[1
]}

BALLANTY.JM ^{[1
]}

机构：

[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14850

来源：

IEEE JOURNAL OF QUANTUM ELECTRONICS | 1974年 / QE10卷 / 03期

关键词：

D O I：

10.1109/JQE.1974.1068144

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：391 / 393

页数：3

共 13 条

[1]

BALLANTYNE JM, 1972, 1 P NSF GRANT US M O

[2]

BREWER GR, 1972, SOLID STATE TECHNOL, V15, P36

[3]

BREWER GR, 1972, SOLID STATE TECHNOL, P43

[4] GRATING COUPLER FOR EFFICIENT EXCITATION OF OPTICAL GUIDED WAVES IN THIN FILMS [J].

DAKSS, ML ;

KUHN, L ;

HEIDRICH, PF ;

SCOTT, BA .

APPLIED PHYSICS LETTERS, 1970, 16 (12) :523-+

[5] ELECTRON-RESIST FABRICATION OF BENDS AND COUPLERS FOR INTEGRATED OPTICAL CIRCUITS [J].

GOELL, JE .

APPLIED OPTICS, 1973, 12 (04) :729-736

[6]

GREENEICH JS, 1973, 12 S EL ION LAS BEAM

[7]

HATZAKIS M, 11 S EL ION LAS BEAM, P337

[8]

HERZOG RF, 11 S EL ION LAS BEAM, P483

[9]

PASIECZNIK J, 1973, 12 S EL ION LAS BEAM

[10] THIN-FILM DISTRIBUTED-FEEDBACK LASER FABRICATED BY ION MILLING [J].

SCHINKE, DP ;

SMITH, RG ;

SPENCER, EG ;

GALVIN, MF .

APPLIED PHYSICS LETTERS, 1972, 21 (10) :494-&

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