ELECTRON-BEAM EXPOSURE OF OPTICAL GRATINGS

被引：6
|
作者：
YANG, L [1 ]
TURNER, JJ [1 ]
RHODES, LB [1 ]
TANG, CL [1 ]
BALLANTY.JM [1 ]
机构：
[1] CORNELL UNIV,SCH ELECT ENGN,ITHACA,NY 14850
来源：
IEEE JOURNAL OF QUANTUM ELECTRONICS | 1974年 / QE10卷 / 03期
关键词：
D O I：
10.1109/JQE.1974.1068144
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：391 / 393
页数：3
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