DEPOSITION OF EPITAXIAL THIN-FILMS OF ND1.85CE0.15CUO4-Y BY LASER ABLATION

被引：48

作者：

GUPTA, A

KOREN, G

TSUEI, CC

SEGMULLER, A

MCGUIRE, TR

机构：

来源：

APPLIED PHYSICS LETTERS | 1989年 / 55卷 / 17期

关键词：

D O I：

10.1063/1.102321

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1795 / 1797

页数：3

共 17 条

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[7] EPITAXIAL-FILMS OF YBA2CU3O7-DELTA ON NDGAO3, LAGAO3, AND SRTIO3 SUBSTRATES DEPOSITED BY LASER ABLATION [J].

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[8] ROLE OF ATOMIC OXYGEN IN THE LOW-TEMPERATURE GROWTH OF YBA2CU3O7-DELTA THIN-FILMS BY LASER ABLATION DEPOSITION [J].

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[9]

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