OXIDATION BEHAVIOR OF PD-SI COMPOUNDS

被引：31

作者：

CROS, A ^{[1
]}

POLLAK, RA ^{[1
]}

TU, KN ^{[1
]}

机构：

[1] IBM CORP,THOMAS J WATSON RES CTR,YORKTOWN HTS,NY 10598

来源：

THIN SOLID FILMS | 1983年 / 104卷 / 1-2期

关键词：

D O I：

10.1016/0040-6090(83)90565-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：221 / 225

页数：5

共 12 条

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