ION-IMPLANTATION AND PROTON-ENHANCED DIFFUSION IN SEMICONDUCTORS

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作者：

GIBBONS, JF ^{[1
]}

机构：

[1] STANFORD UNIV,ELECTR LABS,STANFORD,CA 94305

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1975年 / 170卷 / AUG24期

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中图分类号：

O6 [化学];

学科分类号：

0703 ;

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页码：29 / 29

页数：1

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