HIGH-RESOLUTION OPTICAL-RECORDING ON A-SI FILMS

被引：9
作者：
GOTCHIYAEV, VZ
KOROLKOV, VP
SOKOLOV, AP
CHERNUKHIN, VP
机构：
[1] Institute of Automation, Electrometry USSR Academy of Sci., Novosibirsk
来源：
JOURNAL OF NON-CRYSTALLINE SOLIDS | 1991年 / 137卷
关键词：
D O I：
10.1016/S0022-3093(05)80361-8
中图分类号：
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The changes in optical properties and structure of a-Si films under laser annealing and spatial resolution of optical recording has been studied. The mechanism of the observed changes is discussed. The spatial resolution of up to 2000 lines/mm has been obtained. The difference of solubility for irradiated and nonirradiated regions of the samples has been observed. It is shown that the optical recording on a-Si films is promising for producing of half-tone photomasks of kinofom optical elements.
引用
收藏
页码：1297 / 1300
页数：4
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