REACTIVE HIGH-RATE DC SPUTTERING - DEPOSITION RATE, STOICHIOMETRY AND FEATURES OF TIOX AND TINX FILMS WITH RESPECT TO THE TARGET MODE

被引：118
作者：
SCHILLER, S
BEISTER, G
SIEBER, W
机构：
来源：
THIN SOLID FILMS | 1984年 / 111卷 / 03期
关键词：
D O I：
10.1016/0040-6090(84)90147-0
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：259 / 268
页数：10
相关论文
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