RESONANT TUNNELING IN POLYTYPE INAS/ALSB/GASB HETEROSTRUCTURES

被引:10
作者
LONGENBACH, KF
LUO, LF
XIN, S
WANG, WI
机构
[1] Department of Electrical Engineering, Columbia University, New York
关键词
D O I
10.1016/0022-0248(91)91058-I
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Polytype heterostructures of GaSb/AlSb/InAs show interband tunneling due to the approximately 0.14 eV overlap of the InAs conduction band and the GaSb valence band. This broken-gap configuration results in several novel mechanisms for negative differential resistance (NDR) that have potential applications in high-speed devices. Double-barrier structures exhibit resonant interband tunneling with high peak-to-valley current ratios due to the resonance enhancement of the tunneling current and the bandgap blocking of the nonresonant current components. Using InAs as the base in a double-barrier polytype heterostructure, resonant tunneling at room temperature through a quantum well as wide as 110 nm has been demonstrated. Also, GaSb/InAs/AlSb/GaSb structures have exhibited interband resonant tunneling with peak-to-valley ratios as high as 20:1 at 300 K and peak current densities up to 28 kA/cm2. In addition to tunneling experiments, Ge and Sn have been shown to be well behaved p-type dopants for GaSb grown by molecular beam epitaxy (MBE), exhibiting free acceptor concentrations as high as 2 x 10(19) and 5 x 10(18) cm-3, respectively.
引用
收藏
页码:651 / 658
页数:8
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