AN ULTRAHIGH-VACUUM, LOW-ENERGY ION-ASSISTED DEPOSITION SYSTEM FOR III-V-SEMICONDUCTOR FILM GROWTH

被引：10

作者：

ROHDE, S ^{[1
]}

BARNETT, SA ^{[1
]}

CHOI, CH ^{[1
]}

机构：

[1] NORTHWESTERN UNIV,MAT RES CTR,EVANSTON,IL 60208

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1989年 / 7卷 / 03期

关键词：

D O I：

10.1116/1.575927

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2273 / 2279

页数：7

共 33 条

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