InGaSb;
AlGaAsSb;
strained quantum wells;
Te doped;
D O I:
10.1088/1674-4926/32/10/103002
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
2 mu m InGaSb/AlGaAsSb strained quantum wells and a tellurium-doped GaSb buffer layer were grown by molecular beam epitaxy (MBE). The growth parameters of strained quantum wells were optimized by AFM, XRD and PL at 77 K. The optimal growth temperature of quantum wells is 440 degrees C. The PL peak wavelength of quantum wells at 300 K is 1.98 mu m, and the FWHM is 115 nm. Tellurium-doped GaSb buffer layers were optimized by Hall measurement. The optimal doping concentration is 1.127 x 10(18) cm(-3) and the resistivity is 5.295 x 10(-3) Omega.cm.
机构:
Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Lin, C
Li, AZ
论文数: 0引用数: 0
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机构:
Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
机构:
Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China
Lin, C
Li, AZ
论文数: 0引用数: 0
h-index: 0
机构:
Chinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R ChinaChinese Acad Sci, Shanghai Inst Met, State Key Lab Funct Mat Informat, Shanghai 200050, Peoples R China