Molecular beam epitaxy growth of InGaSb/AlGaAsSb strained quantum well diode lasers

被引:12
作者
Zhang Yu [1 ]
Wang Guowei [2 ]
Tang Bao [2 ]
Xu Yingqiang [2 ]
Xu Yun [1 ]
Song Guofeng [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Nanooptoelect Lab, Beijing 100083, Peoples R China
[2] Chinese Acad Sci, Inst Semicond, Natl Lab Superlattice & Microstruct, Beijing 100083, Peoples R China
基金
北京市自然科学基金; 中国科学院基金;
关键词
InGaSb; AlGaAsSb; strained quantum wells; Te doped;
D O I
10.1088/1674-4926/32/10/103002
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
2 mu m InGaSb/AlGaAsSb strained quantum wells and a tellurium-doped GaSb buffer layer were grown by molecular beam epitaxy (MBE). The growth parameters of strained quantum wells were optimized by AFM, XRD and PL at 77 K. The optimal growth temperature of quantum wells is 440 degrees C. The PL peak wavelength of quantum wells at 300 K is 1.98 mu m, and the FWHM is 115 nm. Tellurium-doped GaSb buffer layers were optimized by Hall measurement. The optimal doping concentration is 1.127 x 10(18) cm(-3) and the resistivity is 5.295 x 10(-3) Omega.cm.
引用
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页数:4
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