ANALYTICAL EXPRESSION FOR THE STANDING WAVE INTENSITY IN PHOTORESIST

被引：49

作者：

MACK, CA

机构：

来源：

APPLIED OPTICS | 1986年 / 25卷 / 12期

关键词：

D O I：

10.1364/AO.25.001958

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：1958 / 1961

页数：4

共 8 条

[1] Berning PH, 1963, PHYS THIN FILMS, V1, P69
[2] OPTICAL LITHOGRAPHY
DILL, FH
[J]. IEEE TRANSACTIONS ON ELECTRON DEVICES, 1975, ED22 (07) : 440 - 444
[3] GRIFFING BF, 1985, SOLID STATE TECHNOL, V28, P152
[4] ILTEN DF, 1971, IMAGE TECHNOL FEB, P9
[5] STANDING WAVES IN PHOTORESISTS
KORKA, JE
[J]. APPLIED OPTICS, 1970, 9 (04): : 969 - &
[6] MACK CA, 1985, P SOC PHOTO-OPT INST, V538, P207
[7] PROJECTION MASKING, THIN PHOTORESIST LAYERS AND INTERFERENCE EFFECTS
MIDDELHOEK, S
[J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1970, 14 (02) : 117 - +
[8] WIDMANN DW, 1975, APPL OPTICS, V14, P931, DOI 10.1364/AO.14.000931