ION-IMPLANTATION DOPING OF INP FOR DEVICE APPLICATIONS

被引：0
|
作者：
VAIDYANATHAN, KV [1 ]
DUNLAP, HL [1 ]
CLARK, MD [1 ]
JULLENS, RA [1 ]
机构：
[1] HUGHES RES LABS,MALIBU,CA 90265
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 06期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C244 / C244
页数：1
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