ON THE USE OF THE AUGER TECHNIQUE FOR QUANTITATIVE-ANALYSIS OF OVERLAYERS

被引:56
作者
MEMEO, R
CICCACCI, F
MARIANI, C
OSSICINI, S
机构
关键词
D O I
10.1016/0040-6090(83)90135-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:159 / 167
页数:9
相关论文
共 13 条
[1]   COPPER ON NI(111) - THE ELECTRON-STATES FROM SUBMONOLAYER TO SEVERAL-MONOLAYER COVERAGES [J].
ABBATI, I ;
BRAICOVICH, L ;
FASANA, A ;
BERTONI, CM ;
MANGHI, F ;
CALANDRA, C .
PHYSICAL REVIEW B, 1981, 23 (12) :6448-6455
[2]   AUGER AND UPS STUDIES OF ADSORBATES [J].
BAKER, BG ;
KLAUBER, C .
APPLICATIONS OF SURFACE SCIENCE, 1982, 13 (1-2) :190-197
[3]   GENERAL FORMALISM FOR QUANTITATIVE AUGER ANALYSIS [J].
CHANG, CC .
SURFACE SCIENCE, 1975, 48 (01) :9-21
[4]  
DAVIES LE, 1976, HDB AUGER ELECTRON S
[5]  
DAVIS LE, 1976, ASTM STP, V596, P52
[6]   REFLECTANCE SPECTROSCOPY OF SILVER SURFACE-LAYERS ON GOLD AND ALUMINUM SUBSTRATES [J].
DECRESCENZI, M ;
LOPEZRIOS, T ;
VUYE, G ;
MANSUR, NJ ;
BORENSZTEIN, Y .
THIN SOLID FILMS, 1979, 57 (01) :89-92
[7]   GROWTH OF THIN PLATINUM FILMS ON HYDROGENATED AMORPHOUS-SILICON AND ITS OXIDE [J].
GOLDSTEIN, B ;
SZOSTAK, DJ .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1980, 17 (03) :718-720
[8]   SURFACE-ANALYSIS WITH AUGER-ELECTRON SPECTROSCOPY [J].
GRANT, JT .
APPLICATIONS OF SURFACE SCIENCE, 1982, 13 (1-2) :35-62
[9]  
Poate J M, 1978, THIN FILMS INTERDIFF
[10]   QUANTITATIVE APPROACH OF AUGER-ELECTRON SPECTROMETRY .1. FORMALISM FOR CALCULATION OF SURFACE CONCENTRATIONS [J].
PONS, F ;
LEHERICY, J ;
LANGERON, JP .
SURFACE SCIENCE, 1977, 69 (02) :565-580