TEMPERATURE-DEPENDENCE OF HALL-EFFECT AND MOBILITY OF SPUTTERING TANTALUM FILMS

被引：1

作者：

RACHMANN, J ^{[1
]}

JUERGENS, W ^{[1
]}

机构：

[1] SIEMENS AG,FORSCH LAB & BAUELEMENTE GRUNDLAGENENTWICKLUNG,POSTFACH 801709,D-8000 MUNICH,FED REP GER

来源：

THIN SOLID FILMS | 1975年 / 26卷 / 02期

关键词：

D O I：

10.1016/0040-6090(75)90144-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：305 / 310

页数：6

共 13 条

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[7] VERY PURE THIN FILM TANTALUM PHASE [J].

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[8]

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[9]

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