X-RAY REFLECTIVITY AND SCANNING-TUNNELING-MICROSCOPE STUDY OF KINETIC ROUGHENING OF SPUTTER-DEPOSITED GOLD-FILMS DURING GROWTH

被引：157

作者：

YOU, H

CHIARELLO, RP

KIM, HK

VANDERVOORT, KG

机构：

[1] Materials Science Division, Argonne National Laboratory, Argonne

来源：

PHYSICAL REVIEW LETTERS | 1993年 / 70卷 / 19期

关键词：

D O I：

10.1103/PhysRevLett.70.2900

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

An in situ x-ray reflectivity study of the dynamic evolution of a growing interface was carried out for gold sputter-deposited onto a polished silicon substrate. X-ray reflectivity data were recorded during growth for thicknesses of the gold film ranging from 50 to 3500 angstrom. A progressive kinetic roughening of the gold-vacuum interface was observed and the time-dependent interfacial width exhibits a power-law behavior. Aided by scanning-tunneling-microscopy measurements the scaling exponents were determined and compared with theoretical studies.

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页码：2900 / 2903

页数：4

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