AN ANALYSIS OF ANGULAR DEPENDENT XPS PEAK INTENSITIES

被引：31

作者：

ARMSTRONG, RA ^{[1
]}

EGELHOFF, WF ^{[1
]}

机构：

[1] NBS,DIV SURFACE SCI,GAITHERSBURG,MD 20899

来源：

SURFACE SCIENCE | 1985年 / 154卷 / 2-3期

关键词：

D O I：

10.1016/0039-6028(85)90031-7

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：L225 / L232

页数：8

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