ROLE OF DC BIAS IN RF SPUTTERING PROCESS OF AMORPHOUS GD-CO FILMS

被引：7

作者：

HIRANO, M

KATAYAMA, T

KOIZUMI, Y

KAWAKAMI, M

TSUSHIMA, T

机构：

[1] ELECTROTECH LAB,TANASHI,TOKYO 188,JAPAN

[2] TOKYO ELECT ENGN COLL,CHIYODA KU,TOKYO 101,JAPAN

[3] NIHON UNIV,CHIYODA KU,TOKYO 101,JAPAN

来源：

JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN | 1977年 / 42卷 / 01期

关键词：

D O I：

10.1143/JPSJ.42.347

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

引用

页码：347 / 348

页数：2

共 7 条

[1] EFFECTS OF DC BIAS ON FABRICATION OF AMORPHOUS GDCO RF SPUTTERED FILMS [J].

BOURNE, HC ;

GOLDFARB, RB ;

WILSON, WL ;

ZWINGMAN, R .

IEEE TRANSACTIONS ON MAGNETICS, 1975, 11 (05) :1332-1334

[2] AMORPHOUS METALLIC FILMS FOR BUBBLE DOMAIN APPLICATIONS [J].

CHAUDHARI, P ;

CUOMO, JJ ;

GAMBINO, RJ .

IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1973, 17 (01) :66-68

[3]

ESHO S, 1976, P JOINT MMM INTERMAG

[4]

FUJIOKA T, 1973, SPUTTERING PRINCIPLE, P27

[5]

HIRANO M, TO BE PUBLISHED

[6] SINGLE-CRYSTAL PREPARATION OF RARE EARTH-COBALT INTERMETALLIC COMPOUNDS BY A BN-COATED CRUCIBLE [J].

KATAYAMA, T ;

SHIBATA, T .

JOURNAL OF CRYSTAL GROWTH, 1974, 24 (OCT) :396-399

[7]

KATAYAMA T, TO BE PUBLISHED

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