HIGH-PERFORMANCE MULTILEVEL BLAZED X-RAY MICROSCOPY FRESNEL ZONE PLATES - FABRICATED USING X-RAY-LITHOGRAPHY

被引：37

作者：

DIFABRIZIO, E

GENTILI, M

GRELLA, L

BACIOCCHI, M

KRASNOPEROVA, A

CERRINA, F

YUN, W

LAI, B

GLUSKIN, E

机构：

[1] UNIV WISCONSIN,CTR XRAY LITHOG,DEPT ELECT & COMP ENGN,MADISON,WI 53706

[2] ARGONNE NATL LAB,ARGONNE,IL 60439

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1994年 / 12卷 / 06期

关键词：

D O I：

10.1116/1.587414

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：3979 / 3985

页数：7

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[7] PARAMETRIC MODELING OF PHOTOELECTRON EFFECTS IN X-RAY-LITHOGRAPHY [J].

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CERRINA, F .

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[8]

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[9]

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[10]

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