THE GROWTH-CHARACTERISTICS OF ION-BEAM SPUTTERED COCR FILMS ON TA ISOLATION LAYERS

被引：15
作者：
GILL, HS
YAMASHITA, T
机构：
[1] Hewlett-Packard Lab, Palo Alto, CA,, USA, Hewlett-Packard Lab, Palo Alto, CA, USA
来源：
IEEE TRANSACTIONS ON MAGNETICS | 1984年 / 20卷 / 05期
关键词：
D O I：
10.1109/TMAG.1984.1063377
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
7
引用
收藏
页码：776 / 778
页数：3
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