A CHEMICAL POLISH METHOD FOR PREPARATION OF SILICON SUBSTRATES FOR EPITAXIAL DEPOSITION

被引：2
|
作者：
FAIRHURST, KM
RICH, GJ
机构：
来源：
MICROELECTRONICS RELIABILITY | 1966年 / 5卷 / 01期
关键词：
D O I：
10.1016/0026-2714(66)90005-9
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：15 / +
页数：1
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