EXPERIMENTAL TEST OF KINETIC THEORIES FOR HETEROGENEOUS FREEZING IN SILICON

被引:45
作者
STOLK, PA
POLMAN, A
SINKE, WC
机构
[1] FOM-Institute for Atomic and Molecular Physics, 1098 SJ Amsterdam
关键词
D O I
10.1103/PhysRevB.47.5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The crystallization rate of liquid silicon has been measured during epitaxial explosive crystallization of amorphous silicon. The measurements, together with numerical temperature calculations indicate that freezing in silicon saturates at 15.8 m/s for large undercooling (> 130 K) below the equilibrium melting temperature. These data, as well as a variety of experimental results of other investigators, are used to test two models describing the kinetics of heterogeneous freezing. A transition-state theory in which the phase transformations are assumed to go through an intermediate state at a rate limited by the sound velocity is not consistent with the data. A theory in which the rate-limiting factor in freezing of liquid silicon is atomic diffusion in the liquid close to the interface describes the data well. The activation energy for self-diffusion of atoms in the liquid near the interface is found to be 0.7-1.1 eV.
引用
收藏
页码:5 / 13
页数:9
相关论文
共 47 条
[1]   PULSED MELTING OF SILICON (111) AND (100) SURFACES SIMULATED BY MOLECULAR-DYNAMICS [J].
ABRAHAM, FF ;
BROUGHTON, JQ .
PHYSICAL REVIEW LETTERS, 1986, 56 (07) :734-737
[2]   TIME-RESOLVED REFLECTIVITY OF ION-IMPLANTED SILICON DURING LASER ANNEALING [J].
AUSTON, DH ;
SURKO, CM ;
VENKATESAN, TNC ;
SLUSHER, RE ;
GOLOVCHENKO, JA .
APPLIED PHYSICS LETTERS, 1978, 33 (05) :437-440
[3]  
Born M., 1975, PRINCIPLES OPTICS
[4]   RAPID MELTING AND REGROWTH VELOCITIES IN SILICON HEATED BY ULTRAVIOLET PICOSECOND LASER-PULSES [J].
BUCKSBAUM, PH ;
BOKOR, J .
PHYSICAL REVIEW LETTERS, 1984, 53 (02) :182-185
[5]  
COX IR, 1985, J VAC SCI TECHNOL A, V3, P674
[6]   ORIENTATION DEPENDENCE OF HIGH-SPEED SILICON CRYSTAL-GROWTH FROM THE MELT [J].
CULLIS, AG ;
CHEW, NG ;
WEBBER, HC ;
SMITH, DJ .
JOURNAL OF CRYSTAL GROWTH, 1984, 68 (02) :624-638
[7]  
CUSTER JS, COMMUNICATION
[8]  
CUSTER JS, IN PRESS APPL PHYS L
[9]   A THERMAL DESCRIPTION OF THE MELTING OF C-SILICON AND A-SILICON UNDER PULSED EXCIMER LASERS [J].
DEUNAMUNO, S ;
FOGARASSY, E .
APPLIED SURFACE SCIENCE, 1989, 36 (1-4) :1-11
[10]   HEAT OF CRYSTALLIZATION AND MELTING-POINT OF AMORPHOUS-SILICON [J].
DONOVAN, EP ;
SPAEPEN, F ;
TURNBULL, D ;
POATE, JM ;
JACOBSON, DC .
APPLIED PHYSICS LETTERS, 1983, 42 (08) :698-700