EFFECTS OF SUBSTRATE TEMPERATURES ON THE DOPING PROFILES OF SI IN SELECTIVELY DOPED ALGAAS/GAAS/ALGAAS DOUBLE-HETEROJUNCTION STRUCTURES

被引:53
作者
INOUE, K [1 ]
SAKAKI, H [1 ]
YOSHINO, J [1 ]
YOSHIOKA, Y [1 ]
机构
[1] MATSUSHITA TECHNORES INC,MORIGUCHI,OSAKA 570,JAPAN
关键词
D O I
10.1063/1.95785
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
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页码:973 / 975
页数:3
相关论文
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SAKAKI H, 1984, 1983 P INT S F QUANT, P94