DEEP LEVELS IN SEMI-INSULATING LEC GAAS BEFORE AND AFTER SILICON IMPLANTATION

被引:5
作者
DINDO, S
ABDELMOTALEB, I
LOWE, K
TANG, W
YOUNG, L
机构
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D O I
10.1149/1.2113646
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:2673 / 2677
页数:5
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