ELECTRICAL-RESISTIVITY DUE TO CRYSTALLINE IMPERFECTIONS IN ALUMINUM THIN-FILMS

被引：0
|
作者：
LEE, CC
SIEGEL, RW
机构：
[1] ROCKWELL INT,MICROELECTRO DEVICE DIV,ANAHEIM,CA 92803
[2] ARGONNE NATL LAB,MAT SCI DIV,ARGONNE,IL 60439
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1975年 / 122卷 / 03期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
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页码：C77 / C77
页数：1
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