RESOLUTION CHARACTERISTICS OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST

被引：7
|
作者：
TANAKA, A
BAN, H
IMAMURA, S
ONOSE, K
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 03期
关键词：
D O I：
10.1116/1.584788
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：572 / 575
页数：4
相关论文
共 50 条
  • [1] IMAGE REVERSAL CHARACTERISTICS OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST (SPP) IN NEAR UV LITHOGRAPHY
    TANAKA, A
    BAN, H
    KAWAI, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1989, 28 (10): : 2099 - 2103
  • [2] Image reversal characteristics of a novel silicone-based positive photoresist (SPP) in near UV lithography
    Tanaka, Akinobu, 1600, (28):
  • [3] PREPARATION OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST AND ITS APPLICATION TO AN IMAGE REVERSAL PROCESS
    TANAKA, A
    BAN, H
    IMAMURA, S
    POLYMERS IN MICROLITHOGRAPHY: MATERIALS AND PROCESSES, 1989, 412 : 175 - 188
  • [4] PREPARATION OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST AND ITS APPLICATION TO AN IMAGE REVERSAL PROCESS
    TANAKA, A
    BAN, H
    IMAMURA, S
    ACS SYMPOSIUM SERIES, 1989, 412 : 175 - 188
  • [5] Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist
    T. Ito
    R. Sawada
    E. Higurashi
    T. Kiyokura
    Microsystem Technologies, 2000, 6 : 165 - 168
  • [6] PREPARATION OF A NOVEL SILICONE-BASED POSITIVE PHOTORESIST (SPP) AND ITS APPLICATION TO AN IMAGE REVERSAL PROCESS
    TANAKA, A
    BAN, H
    IMAMURA, S
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1989, 197 : 76 - PMSE
  • [7] Fabrication of microstructure using fluorinated polyimide and silicone-based positive photoresist
    Ito, T
    Sawada, R
    Higurashi, E
    Kiyokura, T
    MICROSYSTEM TECHNOLOGIES, 2000, 6 (05) : 165 - 168
  • [8] METHACRYLATED SILICONE-BASED NEGATIVE PHOTORESIST FOR HIGH RESOLUTION BILAYER RESIST SYSTEMS.
    Morita, Masao
    Tanaka, Akinobu
    Onose, Katsuhide
    1600, (04):
  • [9] METHACRYLATED SILICONE-BASED NEGATIVE PHOTORESIST FOR HIGH-RESOLUTION BILAYER RESIST SYSTEMS
    MORITA, M
    TANAKA, A
    ONOSE, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1986, 4 (01): : 414 - 417
  • [10] Setting characteristics of silicone-based resilient denture liners
    Fujii, K
    Arikawa, H
    Kanie, T
    Ban, S
    Inoue, M
    DENTAL MATERIALS JOURNAL, 2004, 23 (04) : 566 - 571
12345