LOW-TEMPERATURE REACTIONS AT SI-METAL CONTACTS - FROM SIO2 GROWTH DUE TO SI-AU REACTION TO THE MECHANISM OF SILICIDE FORMATION

被引：40
作者：
HIRAKI, A
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1983年 / 22卷 / 04期
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D O I：
10.1143/JJAP.22.549
中图分类号：
O59 [应用物理学];
学科分类号：
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页码：549 / 562
页数：14
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