MODELING PROJECTION PRINTING OF POSITIVE PHOTORESISTS

[1] Berning PH, 1963, PHYS THIN FILMS, V1, P69

[2] DILL FH, 1974, OCT P KOD MICR SEM S

[3] Iverson K. E., 1962, PROGRAMMING LANGUAGE

[4] LEVI L, 1968, APPLIED OPTICS GUIDE, V1

[5] NEUREUTHER AR, 1974, 18 P MICR RES I S NE

[6] HIGH PERFORMANCE REDUCTION LENSES FOR MICROELECTRONIC CIRCUIT FABRICATION [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1969, 13 (02) : 192 - +

[1] Berning PH, 1963, PHYS THIN FILMS, V1, P69

[2] DILL FH, 1974, OCT P KOD MICR SEM S

[3] Iverson K. E., 1962, PROGRAMMING LANGUAGE

[4] LEVI L, 1968, APPLIED OPTICS GUIDE, V1

[5] NEUREUTHER AR, 1974, 18 P MICR RES I S NE

[6] HIGH PERFORMANCE REDUCTION LENSES FOR MICROELECTRONIC CIRCUIT FABRICATION [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1969, 13 (02) : 192 - +