FABRICATION OF CONTINUOUS-RELIEF MICRO-OPTICAL ELEMENTS BY DIRECT LASER WRITING IN PHOTORESISTS

被引：239
作者：
GALE, MT
ROSSI, M
PEDERSEN, J
SCHUTZ, H
机构：
来源：
OPTICAL ENGINEERING | 1994年 / 33卷 / 11期
关键词：
MICROOPTICS; PLANAR OPTICAL ELEMENTS; DIRECT LASER WRITING; REPLICATION;
D O I：
10.1117/12.179892
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A laser writing system for the fabrication of continuous-relief micro-optical elements in photoresist is described. The technology enables a wide range of planar micro-optical elements to be fabricated and replicated into polymer film using Ni shims electroformed from the photoresist originals. The advantages and limitations of laser writing technology for micro-optics fabrication are discussed. Examples of fabricated micro-optical elements include Fresnel microlenses and microlens arrays, kinoforms, and other continuous-relief phase elements.
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收藏
页码：3556 / 3566
页数：11
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