TEMPERATURE DISTRIBUTION IN CW CO2-LASER ANNEALED SILICON SAMPLES

被引：0
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作者：
NANU, L
COJOCARU, E
MIHAILESCU, IN
机构：
来源：
REVUE ROUMAINE DE PHYSIQUE | 1983年 / 28卷 / 05期
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中图分类号：
O4 [物理学];
学科分类号：
0702 ;
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页码：425 / 429
页数：5
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