THE RESPONSE OF A MICROWAVE MULTIPOLAR BUCKET PLASMA TO A HIGH-VOLTAGE PULSE WITH FINITE RISE TIME

被引：15

作者：

QIN, S

CHAN, C

机构：

[1] Department of Electrical and Computer Engineering, Northeastern University, Boston

来源：

IEEE TRANSACTIONS ON PLASMA SCIENCE | 1992年 / 20卷 / 05期

关键词：

D O I：

10.1109/27.163596

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

A collisional model that describes the response of a microwave multipolar bucket plasma to a high-voltage pulse with finite rise time has been developed for plasma immersion ion implantation (PIII). The agreement between this model and the measurements of the sheath position and target current in a 100 mtorr helium plasma is found to be much improved when the rise time of the pulse and the ion energy distribution during the PIII process are considered.

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收藏

页码：569 / 571

页数：3

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