SI-DEFECT CONCENTRATIONS IN HEAVILY SI-DOPED GAAS - CHANGES INDUCED BY ANNEALING

被引:68
作者
KUNG, JK
SPITZER, WG
机构
[1] UNIV SO CALIF,DEPT MAT SCI,LOS ANGELES,CA 90007
[2] UNIV SO CALIF,DEPT PHYS,LOS ANGELES,CA 90007
关键词
D O I
10.1063/1.1663074
中图分类号
O59 [应用物理学];
学科分类号
摘要
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页码:4477 / 4486
页数:10
相关论文
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