ATOMIC DEFECTS AND STRESSES IN RF-SPUTTERED SIO2 THIN-FILMS

被引：4
|
作者：
SHABALOV, AL
FELDMAN, MS
机构：
[1] Acad of Sciences of the Azerbaijan, SSR, Baku, USSR, Acad of Sciences of the Azerbaijan SSR, Baku, USSR
来源：
THIN SOLID FILMS | 1986年 / 143卷 / 01期
关键词：
D O I：
10.1016/0040-6090(86)90149-5
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
20
引用
收藏
页码：83 / 90
页数：8
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