DIFFUSION OF ION-IMPLANTED ARSENIC IN SILICON

被引:106
作者
FAIR, RB [1 ]
TSAI, JCC [1 ]
机构
[1] BELL TEL LABS INC, READING, PA 19603 USA
关键词
D O I
10.1149/1.2134111
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
引用
收藏
页码:1689 / 1696
页数:8
相关论文
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