CHEMICAL ETCHING OF INGAASP/INP DH WAFER

被引：54
作者：
ADACHI, S
NOGUCHI, Y
KAWAGUCHI, H
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 05期
关键词：
D O I：
10.1149/1.2124014
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1053 / 1062
页数：10
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