ATOMIC FORCE MICROSCOPY ON HOMOEPITAXIAL SRTIO3 FILMS GROWN UNDER MONITORING OF INTENSITY OSCILLATION IN REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION

被引:35
作者
YOSHIMOTO, M [1 ]
OHKUBO, H [1 ]
KANDA, N [1 ]
KOINUMA, H [1 ]
HORIGUCHI, K [1 ]
KUMAGAI, M [1 ]
HIRAI, K [1 ]
机构
[1] KANAGAWA HIGH TECHNOL FDN,MAT CHARACTERIZAT LAB,TAKATSU KU,KAWASAKI 213,JAPAN
关键词
D O I
10.1063/1.108100
中图分类号
O59 [应用物理学];
学科分类号
摘要
Homoepitaxial SrTiO3 film growth by laser molecular beam epitaxy (MBE) was tuned up to a level as to give not only fine streak in the reflection high energy electron diffraction (RHEED) pattern but also the intensity oscillation persisting more than 70 unit cell lengths. The films thus produced were verified to have atomically flat surfaces (root-mean-square roughness of 0.12 nm) and very high crystal quality (chi(min) of 2%) by the analyses of atomic force microscopy and the Rutherford backscattering, respectively.
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页码:2659 / 2661
页数:3
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