NOVEL HOT-ELECTRON EFFECTS IN THE CHANNEL OF MOSFETS OBSERVED BY CAPACITANCE MEASUREMENTS

被引:1
作者
SCHMITTLANDSIEDEL, D
DORDA, G
机构
关键词
D O I
10.1109/T-ED.1985.22114
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:1294 / 1301
页数:8
相关论文
共 17 条
[1]   SUBBAND STRUCTURE OF AN ACCUMULATION LAYER UNDER STRONG MAGNETIC-FIELDS [J].
ANDO, T .
JOURNAL OF THE PHYSICAL SOCIETY OF JAPAN, 1975, 39 (02) :411-417
[3]  
Conwell E M, 1967, HIGH FIELD TRANSPORT
[4]   HIGH-FIELD DRIFT VELOCITY OF ELECTRONS AT THE SI-SIO2 INTERFACE AS DETERMINED BY A TIME-OF-FLIGHT TECHNIQUE [J].
COOPER, JA ;
NELSON, DF .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) :1445-1456
[5]   CURRENT-VOLTAGE CHARACTERISTICS OF FIELD-EFFECT TRANSISTORS WITH SHORT CHANNELS [J].
HESS, K ;
DORDA, G ;
SAH, CT .
SOLID STATE COMMUNICATIONS, 1976, 19 (05) :471-473
[6]   REVIEW OF SOME CHARGE TRANSPORT PROPERTIES OF SILICON [J].
JACOBONI, C ;
CANALI, C ;
OTTAVIANI, G ;
QUARANTA, AA .
SOLID-STATE ELECTRONICS, 1977, 20 (02) :77-89
[7]   ANALYTICAL APPROACH OF HOT-ELECTRON TRANSPORT IN SMALL SIZE MOSFETS [J].
LEBURTON, JP ;
GESCH, H ;
DORDA, G .
SOLID-STATE ELECTRONICS, 1981, 24 (08) :763-771
[8]   EFFECT OF THE ELECTRON-TEMPERATURE ON THE GATE-INDUCED CHARGE IN SMALL SIZE MOS-TRANSISTORS [J].
LEBURTON, JP ;
DORDA, G .
SOLID-STATE ELECTRONICS, 1983, 26 (06) :611-615
[9]   EFFECTS OF DIFFUSION CURRENT ON CHARACTERISTICS OF METAL-OXIDE (INSULATOR)-SEMICONDUCTOR TRANSISTORS [J].
PAO, HC ;
SAH, CT .
SOLID-STATE ELECTRONICS, 1966, 9 (10) :927-+
[10]   EFFECTS OF FIXED BULK CHARGE ON CHARACTERISTICS OF METAL-OXIDE-SEMICONDUCTOR TRANSISTORS [J].
SAH, CT ;
PAO, HC .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1966, ED13 (04) :393-+