TIB2 CHARACTERIZATION BY AUGER-ELECTRON SPECTROSCOPY

被引:1
作者
ADNOT, A [1 ]
SPROULE, GI [1 ]
DALLAIRE, S [1 ]
CHAMPAGNE, B [1 ]
机构
[1] NATL RES COUNCIL CANADA,DIV CHEM,OTTAWA K1A 0R8,ONTARIO,CANADA
关键词
D O I
10.1016/0167-577X(85)90053-9
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:191 / 194
页数:4
相关论文
共 13 条
[1]  
BEROLO AJ, 1981, PHYS REV LETT, V47, P733
[2]  
CHAMPAGNE B, 1984, J LESS-COMMON MET, V98, pL21, DOI 10.1016/0022-5088(84)90308-4
[3]  
DAVIS LE, 1976, HDB AUGER ELECTRON S
[4]  
HORI Y, 1982, 1ST WORKSH WALL COAT, P125
[5]   CHEMICAL BONDING AND ELECTRONIC-STRUCTURE OF B2O3, H3BO3, AND BN - ESCA, AUGER, SIMS, AND SXS STUDY [J].
JOYNER, DJ ;
HERCULES, DM .
JOURNAL OF CHEMICAL PHYSICS, 1980, 72 (02) :1095-1108
[6]   PREFERENTIAL SPUTTERING OF TIC AND TIB2 COATINGS UNDER D+ AND HE-4(+) BOMBARDMENT - PARTIAL YIELDS [J].
KAMINSKY, M ;
NIELSEN, R ;
ZSCHACK, P .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1982, 20 (04) :1304-1308
[7]   CHEMICAL INFORMATION FROM AUGER-ELECTRON SPECTROSCOPY [J].
MADDEN, HH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (03) :677-689
[8]   AUGER INVESTIGATION OF BORON-DOPED SIO2-SI [J].
MOORE, G ;
GUCKEL, H ;
LAGALLY, MG .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1977, 14 (01) :70-74
[9]  
OSIPOV KA, 1981, INORG MATER+, V17, P417
[10]   AES STUDY OF BORON-DIFFUSION IN SILICON FROM A BORON-NITRIDE SOURCE WITH HYDROGEN INJECTION [J].
PIGNATEL, G ;
QUEIROLO, G .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (10) :1805-1810