INVESTIGATIONS ON ULTRATHIN SILICON-NITRIDE AND SILICON DIOXIDE FILMS IN NONVOLATILE SEMICONDUCTOR MEMORY TRANSISTORS

被引：0

作者：

ROY, A ^{[1
]}

LIBSCH, FR ^{[1
]}

WHITE, MH ^{[1
]}

机构：

[1] LEHIGH UNIV,SHERMAN FAIRCHILD CTR,BETHLEHEM,PA 18015

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1986年 / 133卷 / 08期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C316 / C316

页数：1

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