REPAIR OF X-RAY-LITHOGRAPHY MASKS USING UV-LASER PHOTODEPOSITION

被引:12
作者
RANDALL, JN
EHRLICH, DJ
TSAO, JY
机构
[1] MIT, Lincoln Lab, Lexington, MA, USA, MIT, Lincoln Lab, Lexington, MA, USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1985年 / 3卷 / 01期
关键词
D O I
10.1116/1.583241
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
8
引用
收藏
页码:262 / 264
页数:3
相关论文
共 9 条
[1]   ONE-STEP REPAIR OF TRANSPARENT DEFECTS IN HARD-SURFACE PHOTOLITHOGRAPHIC MASKS VIA LASER PHOTODEPOSITION [J].
EHRLICH, DJ ;
OSGOOD, RM ;
SILVERSMITH, DJ ;
DEUTSCH, TF .
ELECTRON DEVICE LETTERS, 1980, 1 (06) :101-103
[2]  
EHRLICH DJ, 1983, J VAC SCI TECHNOL B, V1, P969, DOI 10.1116/1.582718
[3]   POLYIMIDE MEMBRANE X-RAY LITHOGRAPHY MASKS - FABRICATION AND DISTORTION MEASUREMENTS [J].
FLANDERS, DC ;
SMITH, HI .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03) :995-997
[4]  
HOULE FA, 1984, JUN C LAS EL OPT AN
[5]   PHOTODEPOSITION FROM TETRA ETHYL LEAD [J].
RIGBY, LJ .
TRANSACTIONS OF THE FARADAY SOCIETY, 1969, 65 (561P) :2421-&
[6]  
Robinson J W, 1974, HDB SPECTROSCOPY
[7]  
TSAO JY, UNPUB SURF SCI
[8]  
TSAO JY, UNPUB SPIE P
[9]  
WAGNER A, 1983, SPIE J, V393, P167