ULTRAVIOLET LASER-ASSISTED METALORGANIC CHEMICAL VAPOR-DEPOSITION OF GAAS

被引：4
|
作者：
YORK, PK [1 ]
EDEN, JG [1 ]
COLEMAN, JJ [1 ]
FERNANDEZ, GE [1 ]
BEERNINK, KJ [1 ]
机构：
[1] UNIV ILLINOIS,EVERITT LAB,URBANA,IL 61801
来源：
JOURNAL OF APPLIED PHYSICS | 1989年 / 66卷 / 10期
关键词：
D O I：
10.1063/1.344467
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：5001 / 5008
页数：8
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