ANTIREFLECTION-COATED DIFFRACTIVE OPTICAL-ELEMENTS FABRICATED BY THIN-FILM DEPOSITION

被引：26
作者：
PAWLOWSKI, E
KUHLOW, B
机构：
来源：
OPTICAL ENGINEERING | 1994年 / 33卷 / 11期
关键词：
MICROOPTICS; COMPUTER-GENERATED HOLOGRAMS; DIFFRACTIVE MICROLENSES; THIN-FILM DEPOSITION; ANTIREFLECTION COATINGS;
D O I：
10.1117/12.179893
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The use of thin-film deposition in the fabrication of antireflection-coated diffractive optical elements is discussed. The antireflection coatings for these diffractive elements are optimized on the basis of an angular spectrum approach and the method of characteristic matrices. A minimum reflectivity as low as 1x10(-4) is realized using in situ controlled multilayers of TiO2 and SiO2. The blazed profile of the diffractive optical elements is approximated by a stepped profile with up to 32 phase levels. The highest measured diffraction efficiency for 32-level Fresnel zone lenses was 97%.
引用
收藏
页码：3537 / 3546
页数：10
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