CHEMICAL-DEPOSITION OF CDS THIN-FILMS FROM AN ACIDIC BATH

Chemical deposition of CdS films from an alkaline medium using thiourea as a sulphur source is well known. In this communication, for the first time, we report on the chemical deposition of CdS films from an acidic medium using sodium thiosulphate as a sulphur source. The preparative parameters have been optimised. The possible chemical reaction mechanism has been proposed. The optical band gap of the as deposited CdS is 2.55 eV and electrical resistivity is of the order of 10(3)-10(4) ohm cm. The photoelectrochemical characterization showed that films are of n- type and photoactive in nature.