MICROMECHANICAL CANTILEVER RESONATORS WITH INTEGRATED OPTICAL INTERROGATION

被引:21
作者
HOFFMANN, M
BEZZAOUI, H
VOGES, E
机构
[1] Universität Dortmund
关键词
D O I
10.1016/0924-4247(94)00776-4
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The combination of integrated optics and micromechanics on silicon offers micromechanical devices with optical read-out. Integrated optical waveguide devices with silicon oxinitride (SiON) strip waveguides are fabricated by CMOS-compatible PECVD and RIE processes. The stress-compensated SiO2/SiON/SiO2 waveguide layer system is utilized to fabricate cantilever resonators with 50-200 kHz resonance frequency, and a quality factor of about 100. The coupling between optical waveguides across 2 mum gaps is employed to detect resonator vibrations. Arrays of eight resonators with 10 and 1 kHz frequency spacings which are connected via 1 X 8 waveguide branching structures have been fabricated and tested.
引用
收藏
页码:71 / 75
页数:5
相关论文
共 19 条
[1]  
Arnaud J., 1976, BEAM FIBER OPTICS
[2]  
BAZZAOUI H, 1992, MICRO SYSTEM TECHNOL, P234
[3]   INTEGRATED-OPTICS COMBINED WITH MICROMECHANICS ON SILICON [J].
BEZZAOUI, H ;
VOGES, E .
SENSORS AND ACTUATORS A-PHYSICAL, 1991, 29 (03) :219-223
[4]  
BURCHAM KE, 1992, SPIE P, V1793
[5]  
FISCHER K, 1993, APR P EUR C INT OPT
[6]  
FLUGGE W, 1962, HDB ENG MECHANICS, P5
[7]  
GROSCH G, 1990, SENSOR ACTUAT A-PHYS, V21, P1128
[8]  
HEUBERGER A, 1989, MIKORMECHAIK, P139
[9]   A SILICON BASED TECHNOLOGY FOR MONOLITHIC INTEGRATION OF WAVE-GUIDES AND VLSI CMOS CIRCUITS [J].
HILLERINGMANN, U ;
KNOSPE, K ;
HEITE, C ;
SCHUMACHER, K ;
GOSER, K .
MICROELECTRONIC ENGINEERING, 1991, 15 (1-4) :289-292
[10]  
LAMMERINK TSJ, 1991, SENSOR ACTUAT A-PHYS, V25, P685