PARALLEL AND PERPENDICULAR TRANSPORT IN SI/COSI2 AND SI/COSI2/SI HETEROSTRUCTURES

被引:6
|
作者
BADOZ, PA [1 ]
ROSENCHER, E [1 ]
BRIGGS, A [1 ]
DAVITAYA, FA [1 ]
机构
[1] CTR RECH TRES BASSES TEMP,F-38042 GRENOBLE,FRANCE
关键词
COBALT COMPOUNDS - Thin Films;
D O I
10.1016/0749-6036(86)90005-4
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
It has recently become possible to grow epitaxial Si/CoSi//2/Si semiconductor-metal-semiconductor heterostructures of almost perfect crystalline quality. Electronic transport in the plane of the metal film and (parallel transport) is investigated by the extensive studies of resistivity and superconducting properties of these films. The sharp influence of film thickness on both phenomena is presented and its physical origin is briefly discussed. The transfer of hot electrons emitted by the top Si//e//p//i/CoSi//2 diode to the Si//b//u//1//k/CoSi//2 through the metal film (perpendicular transport) is studied. Experimental data strongly favor the hypothesis of ballistic transport with a ballistic mean free path close to the one deduced from resistivity measurements.
引用
收藏
页码:425 / 427
页数:3
相关论文
共 50 条
  • [1] ON THE GROWTH OF COSI2 AND COSI/SI HETEROSTRUCTURES ON SI(111)
    HENZ, J
    OSPELT, M
    VONKANEL, H
    SOLID STATE COMMUNICATIONS, 1987, 63 (06) : 445 - 449
  • [2] AMORPHIZATION AND REGROWTH IN SI COSI2 SI HETEROSTRUCTURES
    MAEX, K
    WHITE, AE
    SHORT, KT
    HSIEH, YF
    HULL, R
    OSENBACH, JW
    PRAEFCKE, HC
    JOURNAL OF APPLIED PHYSICS, 1990, 68 (11) : 5641 - 5647
  • [3] TRANSISTOR ACTION IN SI/COSI2/SI HETEROSTRUCTURES
    HENSEL, JC
    LEVI, AFJ
    TUNG, RT
    GIBSON, JM
    APPLIED PHYSICS LETTERS, 1985, 47 (02) : 151 - 153
  • [4] GROWTH OF COSI2 AND COSI2/SI SUPERLATTICES
    HENZ, J
    OSPELT, M
    VONKANEL, H
    HETEROSTRUCTURES ON SILICON : ONE STEP FURTHER WITH SILICON, 1989, 160 : 215 - 222
  • [5] EXPLOITING SI/COSI2/SI HETEROSTRUCTURES GROWN BY MESOTAXY
    WHITE, AE
    SHORT, KT
    MAEX, K
    HULL, R
    HSIEH, YF
    AUDET, SA
    GOOSSEN, KW
    JACOBSON, DC
    POATE, JM
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1991, 59 : 693 - 697
  • [6] FORMATION AND CHARACTERIZATION OF SI/COSI2,/SI EPITAXIAL HETEROSTRUCTURES
    LAVIA, F
    RAVESI, S
    TERRASI, A
    SPINELLA, C
    APPLIED SURFACE SCIENCE, 1993, 73 : 135 - 140
  • [7] TRANSPORT-PROPERTIES AND ELECTRICAL CHARACTERIZATION OF SI/COSI2/SI HETEROSTRUCTURES
    BADOZ, PA
    ROSENCHER, E
    DAVITAYA, FA
    VIDE-SCIENCE TECHNIQUE ET APPLICATIONS, 1987, 42 (236): : 51 - 53
  • [8] Solid solubility of As in CoSi2 and redistribution at the CoSi2/Si interface
    Mangelinck, D
    Cardenas, J
    d'Heurle, FM
    Svensson, BG
    Gas, P
    JOURNAL OF APPLIED PHYSICS, 1999, 86 (09) : 4908 - 4915
  • [9] Growth mechanism of epitaxial CoSi2 on Si and reactive deposition epitaxy of double heteroepitaxial Si/CoSi2/Si
    Tsuji, Yoshiko
    Mizukami, Makoto
    Noda, Suguru
    THIN SOLID FILMS, 2008, 516 (12) : 3989 - 3995
  • [10] APPLICATION OF EPITAXIAL COSI2/SI/COSI2 HETEROSTRUCTURES TO TUNABLE SCHOTTKY-BARRIER DETECTORS
    SCHWARZ, C
    SCHARER, U
    SUTTER, P
    STALDER, R
    ONDA, N
    VONKANEL, H
    JOURNAL OF CRYSTAL GROWTH, 1993, 127 (1-4) : 659 - 662